PROVision 10 eBeam metrology

An eBeam metrology system with sub-nanometer imaging across multiple layers. It finds nanosheet variations, EUV overlay shifts and voids in 3D transistors, which helps yield in GAA logic, DRAM and NAND.

Why it matters to the stock. Process-control tools are a smaller share of sales than deposition and etch, but they are sold for each new transistor generation and so tie to the same capex cycle.