Intel Foundry and ASML say High NA EUV is in high-volume use

Intel Foundry and ASML said High NA EUV lithography is already in high-volume production at Intel Foundry, with over one million wafers processed and use on select layers of Panther Lake chips. The companies said 18A products using High NA on select layers match or beat 0.33 NA layers, and they are pushing the industry toward larger 6x12-inch masks. The update was tied to SPIE presentations that day.

• Over one million wafers processed with High NA EUV
• Used on select layers of Panther Lake
• 18A High NA layers match or beat 0.33 NA layers
• Industry push toward 6x12-inch masks